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R&D

Overview

R&D Status

Research Fields

Industrial Property Rights Patents

A brighter tomorrow,
engineered by Foosung chemical technology.

  • Lithium Salts and
    Additives

  • Next Generation
    Semiconductor Gas

  • HCFC/HFC
    Substitutes

  • Fluorine-based
    Polymer

  • 3D Semiconductor
    Materials

  • Fluorine-based
    Organics

  • Lithium Salts and Additives

Increasing global awareness regarding nuclear power phase-out and global warming has stimulated eco-friendly technology development, and accordingly, R&D in this field is active. Research on lithium salts and additives for lithium-ion secondary batteries for high-capacity, high-power devices such as EV and renewable energy storage devices is being actively conducted.

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  • Next Generation Semiconductor Gas

The need for semiconductor special gas research is increasing, as memory semiconductor processes are becoming more sophisticated and highly integrated. Based on our semiconductor gas technology (C4F6, WF6, CHF3), we are conducting R&D in next generation semiconductor gas for various semiconductor manufacturing use such as etching, deposition and cleaning.

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  • HCFC/HFC Substitutes

Fluorine-based chemicals such as refrigerants, blowing agents, and detergents are widely used on a daily basis. In accordance with the 2015 Paris Agreement of the UNFCCC to reduce greenhouse gases, we are conducting R&D in HFO-based materials such as HFO-1234yf and HFO-1234ze, which have low global warming potential.

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  • Fluorine-based Polymer

Unlike other polymers, fluorine-based polymers exhibit superior properties in heat, chemical, and weather resistance, as well as electrical insulation, making them essential to key basic materials in various fields. By utilizing its fluorine-based monomer manufacturing technology, Foosung Research Institute is conducting R&D on specialty fluorine-based polymers applicable to the display, sensor, and textile industries.

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  • 3D Semiconductor Materials

With the miniaturization of DRAM, expansion of power consumption reduction, and 3D NAND vertical scaling, new materials applicable to 3D semiconductor technology is required. We are making efforts to develop deposition materials (High-k, Low-k) that enable high uniformity in 3D structure, as well as wet etchant optimized to 3D semiconductor structure.

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  • Fluorine-based Organics

We are conducting R&D in various fluorine-based organic compounds and transparent polyimide monomer syntheses by exploiting our manufacturing technology of various fluorine raw materials (H2, F2, HFA, HFP), the heart of fluorine chemistry.

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