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Specialty Gas

C4F6 / WF6
CH2F2 / CHF3
C4F6
c4f6

C4F6
[Hexafluorobutadiene]

· APPLICATION Dry etching gas used in semiconductor etching process
· PACKING Cylinder : Cr-mo, 47L / Valve : DISS 724, CGA 350 etc. /
Filling weight (KG) : 25KG, 45KG

MSDS Download

· Product Specifications

Classification Unit Standard
Purity % > 99.9
OFC ppm < 700
N2 ppm < 40
O2+Ar ppm < 10
HF ppm < 10
H2O ppm < 20
CO ppm < 10
CO2 ppm < 20
WF6
c4f6

WF6
[Tungsten Hexafluoride]

· APPLICATION Deposition gas used in semiconductor deposition process
· PACKING Cylinder : SUS316L, 40L / Valve : DISS 638, JISS22R /
Filling weight (KG) : 50KG, 70KG

MSDS Download

· Product Specifications

Classification Unit Standard
Purity % > 99.9995
O2+Ar ppm < 0.5
N2 ppm < 0.5
CO ppm < 0.5
CO2 ppm < 0.5
SiF4 ppm < 0.5
SF6 ppm < 0.5
CF4 ppm < 0.5
HF ppm < 1
Cr ppb < 50
Na ppb < 50
Cu ppb < 50
Fe ppb < 20
Ca ppb < 50
Zn ppb < 50
Ni ppb < 100