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Specialty Gas

C4F6 / WF6
CH2F2 / CHF3
CH2F2
c4f6

CH2F2
[Difluoromethane]

· APPLICATION Dry Etching Gas used in semiconductor etching process
· PACKING Cylinder : Mn-Steel, 47L / Valve : JIS22L, DISS724 /
Filling weight (KG) : 30KG, 35KG

MSDS Download

· Product Specifications

Classification Unit Standard
Purity % > 99.99
H2O ppm < 10
HF ppm < 1
N2 ppm < 20
O2 ppm < 5
CO2 ppm < 1
OHFC ppm < 10
CHF3
c4f6

CHF3
[Trifluoromethane]

· APPLICATION Dry Etching Gas used in semiconductor etching process
· PACKING Cylinder : Mn-Steel, 47L / Valve : CGA660 /
Filling weight (KG) : 30KG

MSDS Download

· Product Specifications

Classification Unit Standard
Purity % > 99.995
H2O ppm < 3
HF ppm < 1
N2 ppm < 10
O2 ppm < 10
CO2 ppm < 5
OFC ppm < 1